AVIZA TECHNOLOGY, INC.

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Patent Activity in the Last 10 Years

Technologies

Intl Class Technology Matters Rank in Class
 
  
 
C23C COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL 1091
 
  
 
H01L SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR 3359
 
  
 
B05D PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL 186
 
  
 
C23F NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES 135
 
  
 
F24H FLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, IN GENERAL 126
 
  
 
F26B DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM 129
 
  
 
F27D DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE 124

Top Patents (by citation)

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Recent Publications

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Recent Patents

Patent # Title Filing Date Issue Date Intl Class
7227292 Methods of depositing piezoelectric filmsApr 06, 04Jun 05, 07[H01L]
6802712 Heating system, method for heating a deposition or oxidation reactor, and reactor including the heating systemOct 14, 03Oct 12, 04[F27D]
6761770 Atmospheric pressure wafer processing reactor having an internal pressure control system and methodAug 23, 02Jul 13, 04[C23C]
6576060 Protective gas shield apparatusMay 19, 00Jun 10, 03[C23C]
6352592 Free floating shield and semiconductor processing systemJan 27, 00Mar 05, 02[C23C]
6206973 Chemical vapor deposition system and methodJan 06, 00Mar 27, 01[C23C]
6143080 Wafer processing reactor having a gas flow control system and methodJan 28, 00Nov 07, 00[C23C]
6056824 Free floating shield and semiconductor processing systemNov 03, 98May 02, 00[C23C]
6026589 Wafer carrier and semiconductor apparatus for processing a semiconductor substrateFeb 02, 98Feb 22, 00[F26B]
5944900 Protective gas shield for chemical vapor deposition apparatusNov 24, 97Aug 31, 99[C23C]

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Expired/Abandoned/Withdrawn Patents

Patent # Title Status Filing Date Issue/Pub Date Intl Class
2010/0117,203 OXIDE-CONTAINING FILM FORMED FROM SILICONAbandonedJan 30, 07May 13, 10[H01L]
7470470 System and method for forming multi-component dielectric filmsExpiredApr 21, 04Dec 30, 08[B32B]
2008/0210,168 SINGLE CHAMBER, MULTIPLE TUBE HIGH EFFICIENCY VERTICAL FURNACE SYSTEMAbandonedJan 17, 08Sep 04, 08[C23C, H01L]
2008/0079,220 ROTARY SEAL FOR DIFFUSION FURNANCE INCORPORATING NONMETALLIC SEALSAbandonedAug 29, 06Apr 03, 08[F16J]
7335569 In-situ formation of metal insulator metal capacitorsExpiredJul 18, 03Feb 26, 08[H01L]
2008/0038,486 Radical Assisted Batch Film DepositionAbandonedAug 02, 07Feb 14, 08[C23C]
2008/0000,424 Showerhead for a Gas Supply ApparatusAbandonedJun 29, 06Jan 03, 08[C23C, B05B]
2007/0194,470 DIRECT LIQUID INJECTOR DEVICEAbandonedFeb 19, 07Aug 23, 07[C23C, B01F]
2007/0160,756 Apparatus and method for the deposition of ruthenium containing filmsAbandonedJan 07, 06Jul 12, 07[C23C]
2007/0137,794 THERMAL PROCESSING SYSTEM WITH ACROSS-FLOW LINERAbandonedJan 26, 07Jun 21, 07[C23C, H01L]
7205247 Atomic layer deposition of hafnium-based high-k dielectricExpiredSep 29, 04Apr 17, 07[H01L]
2007/0028,838 Gas manifold valve clusterAbandonedJul 31, 06Feb 08, 07[C23C]
2007/0031,598 Method for depositing silicon-containing filmsAbandonedJul 07, 06Feb 08, 07[C23C]
2007/0022,959 Deposition apparatus for semiconductor processingAbandonedJul 31, 06Feb 01, 07[C23C]
2007/0010,072 Uniform batch film deposition process and films so producedAbandonedJul 07, 06Jan 11, 07[H01L]
2006/0264,066 Multilayer multicomponent high-k films and methods for depositing the sameAbandonedApr 07, 06Nov 23, 06[H01L]
2006/0258,078 Atomic layer deposition of high-k metal oxidesAbandonedAug 18, 03Nov 16, 06[H01L]
2006/0228,888 Atomic layer deposition of high k metal silicatesAbandonedAug 18, 03Oct 12, 06[H01L]
7109131 System and method for hydrogen-rich selective oxidationExpiredJun 06, 03Sep 19, 06[H01L]
2006/0178,019 Low temperature deposition of silicon oxides and oxynitridesAbandonedAug 18, 03Aug 10, 06[H01L]

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